Electrochromism of DC magnetron sputtered TiO2 thin films: Role of deposition parameters
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چکیده
منابع مشابه
DEPOSITION OF THIN TiO2 FILMS BY DC MAGNETRON SPUTTERING METHOD
Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
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R. YORDANOV, S. BOYADJIEV, V. GEORGIEVA Department of Microelectronics, Technical University of Sofia, 8 Kl. Ohridski Blvd, 1756, Sofia, Bulgaria Budapest University of Technology and Economics, Department of Inorganic and Analytical Chemistry, Technical Analytical Chemistry Research Group of the Hungarian Academy of Sciences, H-1111 Budapest, Műegyetem rakpart 4, Hungary Institute of Solid Sta...
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ZnO thin films were deposited on glass substrates using direct current (dc) magnetron sputtering under high working pressures. A pure zinc target was used, and sputtering was carried out in an oxygen atmosphere. The working pressure was varied between 50-800 mTorr. XRD characterization showed that for a window of working pressures between 300-500 mTorr, the deposited films were polycrystalline,...
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In the present work two individual metallic targets of Cd and Te were used for the deposition of CdTe thin films on mica substrates from room temperature to 300 C by DC reactive magnetron sputtering method. XRD patterns of CdTe exhibit peaks at 2θ = 27.7, 36. 2 and 45.1, which corresponds to reflection on (2 0 0), (2 2 0) and (3 1 1) planes of CdTe cubic structure, respectively. The conductivit...
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The growth characteristics of magnetron sputtered Co-22%Cr thin films on amorphous glass or carbon substrates have been investigated utilizing transmission electron microscopy, X-ray diffraction and electrical resistivity measurements. Results indicate that the initial deposit is “amorphous”. but that small crystallites form before the film reaches 5 nm film thickness. By 10 nm, well oriented g...
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ژورنال
عنوان ژورنال: Solar Energy Materials and Solar Cells
سال: 2013
ISSN: 0927-0248
DOI: 10.1016/j.solmat.2013.03.035